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sputtering

英 [ˈspʌtərɪŋ]

美 [ˈspʌtərɪŋ]

v.  (引擎、灯或火)发噼啪声; 气急败坏地说; 急促而语无伦次地说
sputter的现在分词

复数:sputterings 

计算机化学

COCA.27161

柯林斯词典

  • VERB (发动机)发出噼啪声;(火焰)发出毕剥声
    If something such as an engine or a flamesputters, it works or burns in an uneven way and makes a series of soft popping sounds.
    1. The truck sputtered and stopped...
      卡车噼啪响了几声停下了。
    2. Engines sputtered to life again...
      发动机噼啪噼啪地重新开动了。
    3. The flame sputters out.
      火焰毕剥作响。
    4. ...the sputtering engine.
      噼啪作响的发动机
    5. Sputteris also a noun.
    6. All I could hear was the sputter of the fire.
      我只能听到火的毕剥声。
  • VERB (过程、行动或事态)缓慢不稳地进行,慢慢结束
    If a process, action, or state of affairssputters, it progresses slowly and unevenly or starts to end.
    1. The economy is already sputtering, with low or no growth...
      经济发展速度已经放慢,增长率很低,或者根本没有增长。
    2. The battle sputtered to a halt in mid-October...
      战斗于 10 月中旬渐渐停了下来。
    3. The whole thing sputtered out.
      整个事态渐渐平息了下来。
  • VERB (尤指因生气、震惊或激动)结结巴巴地说话,语无伦次地说话
    If yousputter, you speak with difficulty and make short sounds, especially because you are angry, shocked, or excited.
    1. Stunned, I sputtered, 'What do you mean?'...
      我大吃一惊,结结巴巴地问道:“你是什么意思?”
    2. Our father's face had reddened with rage and he began to sputter...
      我们的父亲气得涨红了脸,说话开始语无伦次。
    3. He began to sputter his reply.
      他开始结结巴巴地回答。

英英释义

noun

双语例句

  • The sputtering power has a great influence upon the structural and electrochemical properties of tin oxide films.
    溅射功率对薄膜的电化学性能有较大的影响。
  • Microstructures and Tribological Properties of TiC/ a-C Films Grown by Magnetron Sputtering
    磁控溅射TiC/a-C薄膜的结构和摩擦学性能研究
  • Effects of Deposition Pressure on Nanocrystalline Silicon Thin Film by Magnetron Sputtering
    沉积压力对磁控溅射纳米硅薄膜结构和性能影响
  • ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
    采用直流磁控溅射工艺,室温下在载玻片上制备了氧化锌铝透明导电薄膜。
  • Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
    沉积速率是磁控溅射镀膜技术中的一项重要指标,它由许多因素决定。
  • The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
    从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
  • Deposition rate is increase quickly with sputtering power.
    结果表明溅射功率对沉积速率的影响最大,随溅射功率的增大沉积速率快速增大。
  • Fabrication and structure research of silicon films prepared by RF magnetron sputtering
    射频磁控溅射硅薄膜的制备与结构研究
  • Research on the Microstructure and Electric Breakdown Strength of Silicon Oxide Thin Film Deposited by RF Magnetron Reactive Sputtering
    射频磁控反应溅射氧化硅薄膜微结构和电击穿场强研究
  • All these multilayers are deposited by magnetron sputtering method on microcrystalline glass substrates.
    采用磁控溅射方法,在微晶玻璃制备了多层膜。